SSAIL is a two-step process:
SSAIL technology enables forming conductive traces on different form factors:
3D surfaces
Thin films
Flexible materials
Transparent materials
From 1μm width traces to large conductive areas
SSAIL technology works on standard dielectric materials: various polymers, glass, silicon, ceramics.
No metal additives are needed.
Iure enim sint omnis laudantium magni sunt.
| PA6 | PF | FR-4 |
| PA6 | PF | FR-4 |
| PA6 | PF | FR-4 |
Omnis similique excepturi omnis aspernatur.
| 1 | PEEK | FR-4 |
| 2 | PEEK | FR-4 |
| 3 | PEEK | FR-4 |